MM-WAVE DIELECTRIC PARAMETERS OF MAGNESIUM FLUORIDE GLASS WAFERS
نویسندگان
چکیده
منابع مشابه
Processing and Characterization of 300 mm Argon-Annealed Wafers
High nitrogen doped 300 mm silicon wafers annealed in 100 % argon ambient were investigated whether modified pulling conditions will lead to improved slip behavior and homogeneous radial oxygen precipitation. It turned out that increasing of the cooling rate during crystal pulling is beneficial on these wafer defect parameters. The void morphology was investigated by TEM and oxygen precipitatio...
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Northrop Grumman Space Technology (NGST) has recently initiated process development for fabricating 0.1 μm InGaAs/InAlAs/InP High Electron Mobility Transistor (HEMT) MMICs on 100 mm InP substrates. Successful development of this process will further reduce costs for InP HEMT MMICs and rival those of GaAs-based HEMT MMICs, including GaAs-based metamorphic HEMT technology, with superior performan...
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ژورنال
عنوان ژورنال: Progress In Electromagnetics Research M
سال: 2017
ISSN: 1937-8726
DOI: 10.2528/pierm17081805